Concept:Mass action law states that in a semiconductor at thermal equilibrium, the product of electron and hole concentrations equals the square of the intrinsic concentration:
nenh=ni2.
Explanation:Pure silicon at 300 K has equal electron and hole concentrations:
ni=1016m−3.
Phosphorus is a pentavalent donor impurity, so doping with
1021 atoms per m³ converts silicon into an n-type semiconductor.
In an n-type material, electrons are the majority carriers and holes are the minority carriers.
Since the donor concentration is much larger than the intrinsic concentration, the new electron concentration is approximately
ne≈1021m−3.
At thermal equilibrium, the mass action law holds:
nenh=ni2Rearranging for the new hole concentration:
nh=neni2Substituting the given values:
nh=1021(1016)2=10211032=1011m−3Answer:The new hole concentration in the doped silicon crystal is
1011 per m³.
Correct option: D.