Concept:In a doped semiconductor, the product of electron and hole concentrations remains constant as per the law of mass action.
Explanation:Given, intrinsic carrier concentration at 301 K is
ni=1016 m−3.
When
1021 phosphorus atoms are added per cubic metre, the crystal becomes n-type.
For an n-type semiconductor, the electron concentration
n equals the donor concentration
ND.
Thus,
n=ND=1021 m−3.
Using the law of mass action,
n⋅p=ni2.
Substituting the known values, we get
p=nni2.
Therefore,
p=1021(1016)2=10211032=1011 m−3.
This drastic increase in electrons suppresses the hole concentration to maintain thermal equilibrium.
Answer:The new hole concentration in silicon is
1011 m−3.
Hence, the correct option is B.